Laser Photomask Market Size 2021: Important Development, Industry Share and Growth Forecast to 2024

Laser Photomask

The “Laser Photomask Market” Report provides a thorough examination of the market. The Laser Photomask Market research investigates how firms in the Laser Photomask Market are reacting to changing market conditions by examining major industry strategies. The report covers current top players are recognised and rated based on their market shares. It also includes data on leading manufacturers, market segmentation by types, applications, and geographic regions. Market capacity, production, consumption, sales, and revenue are all discussed in this Laser Photomask market report.

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Competitor Analysis:

Laser Photomask market covers the vision of competitor analysis by product types, market share, applications, sales and revenue. It covers the top key players like –

  • KLA
  • Tencor Corporation
  • Applied Materials Inc.
  • Photronics Inc.
  • Nippon Filcon Co. Ltd
  • Compugraphics
  • Toppan Printing Co. Ltd
  • SK
  • Electronics Co. Ltd
  • Hoya Corporation
  • LG Innotek Co. Ltd
  • Taiwan Mask Corporation

    Market Overview:

  • The laser photomask market is expected to record a CAGR over 2% over the forecast period (2019-2024). A photomask is a fused silica plate, covered with a pattern of opaque, transparent, and phase-shifting areas that are projected onto wafers in the lithography process to define the layout of one layer of an integrated circuit.
  • – As transistors have become smaller and smaller, photomasks have become more complex, to transfer the pattern to silicon wafers accurately. The process of creating photomasks has become correspondingly more advanced, as even slight defects in a photomask can impact the silicon device’s performance.
  • – Verifying that a photomask pattern is defect-free is very critical, especially in the case of high-revenue earning chips. Each chip is the end product in the semiconductor lithography process, with an integral part being the optical lithography that is enabled by a light source. The sources of light used for these photomasks are deep ultraviolet (DUV) and extreme ultraviolet (EUV) light sources.
  • – With the growing demand for semiconductors with even higher performance for applications, such as big data analysis, artificial intelligence, and the commercialization of driverless car technology, EUV exposure is garnering attention as a next-generation semiconductor manufacturing technology. This trend has significantly driven the production of effective photomasks. Toppan in 2016 developed a next-generation EUV photomask for leading-edge semiconductors. The new photomask minimizes unwanted reflections of light to peripheral sections during EUV exposure, emerging as a next-generation semiconductor manufacturing technology.<

    Key Market Trends:

    Increasing Use of Electronic Devices

    – The demand for electronic devices, such as tablets, smartphones, and phablets, among others are increasing at a rapid rate. A rise in demand for these devices has been growing especially in the developing countries, such as India, China, and other countries.
    – Factors, such as an increase in disposable income and emerging middle class, are propelling the demand for these devices even further.
    – The aforementioned electronics devices are powered by integrated circuits (microchips); a photomask contains the pattern of an integrated circuit and is used for manufacturing them.

    Asia-Pacific is Expected to Hold a Significant Share

    – Asia-Pacific countries are the leading regions in the semiconductor industry. China and South Korea are the leading countries in the photomask market. These countries are the home to most of the key electronics manufacturing companies.
    – Additionally, China is witnessing a massive demand for semiconductor components, especially integrated chips. The Chinese government has also done some changes in its policy to encourage the development of the domestic semiconductor industry.
    – Moreover, trade fairs also contribute significantly to the growth of the region in the market. Photomask Japan is an international symposium and technical exhibition on photomasks and lithography in Japan. The symposium aims to bring together engineers and investigators from all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends.

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    Scope of the Report:

    A photomask is a tool used for productions of components, including electronic devices (semiconductors), displays, PCB, and MEMS. It is a master copy for the patterning.

    – Electronic devices – Devices, such as CPU and other memory devices that require semiconductor/IC use photomasks.

    – Discreet components with a single task – Transistors and memories

    – Light receiving/ emitting elements – CCD/CMOS image sensors and LED

    – Display devices – LCD and OLED

    – MEMS (Micro Electro Mechanical System) – Acceleration sensors

    – Magnetic heads for hard disks, among various others.

    Highlighted points of Laser Photomask Market Report:

    • Varying dynamics of the Laser Photomask industry.
    • Prospective changes in sales volumes and worldwide share growth in upcoming years
    • Laser Photomask market report recognizes the key drivers of growth and challenges of the key industry players.
    • Competitors profiles along with product description, overview, and business data.
    • Complete analysis of market risks, opportunities, limitations, and growth of the market.
    • Market driving and restraining factors.
    • Delivers information on the historical and current market size and the future potential of the market.
    • Laser Photomask market report provides comprehensive analysis of the market with respect to market dynamics, competitive analysis, and upcoming trends of market.

    Key Benefits of this Laser Photomask Market report:

    • The Laser Photomask market report provides a comprehensive analysis of the current trends and future estimations in the world mining equipment market to identify the potential investment pockets.
    • The Laser Photomask market report presents information regarding key drivers, restraints, and opportunities with a detailed impact analysis.
    • Quantitative analysis of the current trends and forecasts to 2024 is provided to showcase the financial competency of the Laser Photomask market.
    • Porter’s Five Force model of the industry and SWOT analysis illustrate the potency of the buyers & suppliers.
    • Value chain analysis provides a clear understanding of the roles of stakeholders involved.

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    Detailed TOC of Laser Photomask Market Report:

    1.1 Study Deliverables
    1.2 Study Assumptions
    1.3 Scope of the Study



    4.1 Market Overview
    4.2 Introduction to Market Drivers and Restraints
    4.3 Market Drivers
    4.3.1 Increasing Use of Electronic Devices
    4.3.2 Advent of Technologies, such as Big Data and AI
    4.4 Market Restraints
    4.4.1 Complexity in Fabrication
    4.5 Industry Attractiveness – Porter’s Five Forces Analysis
    4.5.1 Threat of New Entrants
    4.5.2 Bargaining Power of Buyers/Consumers
    4.5.3 Bargaining Power of Suppliers
    4.5.4 Threat of Substitute Products
    4.5.5 Intensity of Competitive Rivalry

    5.1 Technology Overview
    5.2 Trade Type
    5.2.1 Captive
    5.2.2 Merchant

    6.1 By Photomask Type
    6.1.1 Reticles
    6.1.2 Masters
    6.2 Geography
    6.2.1 North America
    6.2.2 Europe
    6.2.3 Asia-Pacific
    6.2.4 Latin America
    6.2.5 Middle East & Africa

    7.1 Company Profiles
    7.1.1 KLA-Tencor Corporation
    7.1.2 Applied Materials Inc.
    7.1.3 Photronics Inc.
    7.1.4 Nippon Filcon Co. Ltd
    7.1.5 Compugraphics
    7.1.6 Toppan Printing Co. Ltd
    7.1.7 SK-Electronics Co. Ltd
    7.1.8 Hoya Corporation
    7.1.9 LG Innotek Co. Ltd
    7.1.10 Taiwan Mask Corporation



    Contact Us:

    Name: Ajay More

    Phone: +44 20 3239 8187 / +14242530807

    Email: [email protected]

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